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Acetylene, molecular formula C2H2, commonly known as wind coal or calcium carbide gas, is the smallest member of alkyne compounds. Acetylene is a colorless, slightly toxic and extremely flammable gas with weak anesthetic and anti-oxidation effects under normal temperature and pressure.
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Carbon tetrafluoride, also known as tetrafluoromethane, is a colorless gas at normal temperature and pressure, insoluble in water. CF4 gas is currently the most widely used plasma etching gas in the microelectronics industry. It is also used as a laser gas, cryogenic refrigerant, solvent, lubricant, insulating material, and coolant for infrared detector tubes.
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Sulfur hexafluoride, whose chemical formula is SF6, is a colorless, odorless, non-toxic, and non-flammable stable gas. Sulfur hexafluoride is gaseous under normal temperature and pressure, with stable chemical properties, slightly soluble in water, alcohol and ether, soluble in potassium hydroxide, and does not react chemically with sodium hydroxide, liquid ammonia and hydrochloric acid.
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Hydrogen sulfide is an inorganic compound with a molecular formula of H2S and a molecular weight of 34.076. Under standard conditions, it is a flammable acid gas. It is colorless and has the smell of rotten eggs at low concentrations. poison. The aqueous solution is hydrogen sulfuric acid
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Sulfur dioxide (sulfur dioxide) is the most common, simplest, and irritating sulfur oxide with the chemical formula SO2. Sulfur dioxide is a colorless and transparent gas with a pungent odor. Soluble in water, ethanol and ether, liquid sulfur dioxide is relatively stable, inactive, non-combustible, and does not form an explosive mixture with air. Sulfur dioxide has bleaching properties. Sulfur dioxide is commonly used in industry to bleach pulp, wool, silk, straw hats, etc. Sulfur dioxide can also inhibit the growth of mold and bacteria.
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Silane SiH4 is a colorless, toxic and very active compressed gas at normal temperature and pressure. Silane is widely used in the epitaxial growth of silicon, raw materials for polysilicon, silicon oxide, silicon nitride, etc., solar cells, optical fibers, colored glass manufacturing, and chemical vapor deposition.
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